Search results for "Oxide film"

showing 10 items of 14 documents

Study of nickel corrosion processes by molecular dynamics with reactive potential ReaxFF

2012

Understanding of corrosion processes is important for the study of the durability of materials in aggressive environment. The objective is to provide new lights on the corrosion processes of nickel in aqueous condition with molecular dynamics simulation using a reactive force field "ReaxFF."We are particularly interested by the reaction between water molecules and mono-crystalline surfaces of nickel. No dissociation of water was showed on the surfaces. Moreover, an adsorption of molecules in bilayer was observed, reflecting the mutual polarization between water and nickel, which confirms the charge calculation. The metal surface is positively charged and the first water layer charged negati…

Film d’oxydeNickel[CHIM.OTHE] Chemical Sciences/Other[SPI.OTHER] Engineering Sciences [physics]/OtherPolarizationDynamique moléculaireElectric fieldChamp électriqueCorrosion aqueuseMolecular dynamicsAqueous corrosionOxide filmPolarisation
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Physicochemical characterization and photoelectrochemical analysis of iron oxide films

2013

Iron oxide films with a nanoporous structure were grown by anodizing sputter-deposited Fe in a fluoride containing ethylene glycol solution and annealed under air exposure at different temperatures. X-ray diffraction and Raman spectroscopy allowed to identify the presence of hematite and/or magnetite after thermal treatment for films annealed at T ≥ 400 °C under air exposure. According to GDOES compositional depth profiles, the thermal treatment sensitively reduced the amount of fluoride species incorporated into the film during the anodizing process. A band gap value of ~2.0 eV was estimated for all the investigated layers, while a flat band potential dependent on both the growth condition…

Materials scienceAnodizingNanoporousBand gapInorganic chemistryAnalytical chemistryIron oxideThermal treatmentHematiteCondensed Matter PhysicsPhysicochemical characterization photoelectrochemical analysis iron oxide filmssymbols.namesakechemistry.chemical_compoundSettore ING-IND/23 - Chimica Fisica Applicatachemistryvisual_artElectrochemistryvisual_art.visual_art_mediumsymbolsGeneral Materials ScienceElectrical and Electronic EngineeringRaman spectroscopyFluoride
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In situ monitoring of pulsed laser indium–tin-oxide film deposition by optical emission spectroscopy

2001

We performed optical emission spectroscopy to monitor the plasma produced during the ablation of indium-tin-oxide targets under different oxygen pressure conditions using a pulsed UV laser. Molecular bands of InO were identified in the fluorescent spectra produced by pulsed laser ablation. InO line monitoring allowed obtaining the optimal conditions for good-quality ITO film deposition. We demonstrated that it is possible to correlate InO line spectroscopic parameters with the conditions required to fabricate a high-conductivity and high-transparent ITO thin film. In particular, low resistivity (10-4 to 10-3 Ω cm) was obtained in films deposited at room temperature by regulating oxygen pres…

Materials sciencebusiness.industryAnalytical chemistryPlasmaIndium–tin-oxide films Pulsed laser deposition Optical emission spectroscopy Plasma diagnosticsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsAnalytical ChemistryIndium tin oxidePulsed laser depositionElectrical resistivity and conductivityOptoelectronicsPlasma diagnosticsPLD ITO optical spectroscopyThin filmbusinessInstrumentationSpectroscopyDeposition (law)Line (formation)Spectrochimica Acta Part B: Atomic Spectroscopy
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Nucleation and growth of ZnO on PMMA by low-temperature atomic layer deposition

2015

ZnO films were grown by atomic layer deposition at 35 °C on poly(methyl methacrylate) substrates using diethylzinc and water precursors. The film growth, morphology, and crystallinity were studied using Rutherford backscattering spectrometry, time-of-flight elastic recoil detection analysis, atomic force microscopy, scanning electron microscopy, and x-ray diffraction. The uniform film growth was reached after several hundreds of deposition cycles, preceded by the precursor penetration into the porous bulk and island-type growth. After the full surface coverage, the ZnO films were stoichiometric, and consisted of large grains (diameter 30 nm) with a film surface roughness up to 6 nm (RMS). T…

Materials scienceta114Scanning electron microscopeAnalytical chemistryNucleationthin film growthCrystal growthSurfaces and InterfacesCondensed Matter PhysicsRutherford backscattering spectrometrySurfaces Coatings and FilmsElastic recoil detectionCrystallinityAtomic layer depositionSurface roughnessta116zinc oxide filmsJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Nanostructuring thin Au films on transparent conductive oxide substrates

2013

Fabrication processes of Au nanostructures on indium-tin-oxide (ITO) surface by simple, versatile, and low-cost bottom-up methodologies are investigated in this work. A first methodology exploits the patterning effects induced by nanosecond laser irradiations on thin Au films deposited on ITO surface. We show that after the laser irradiations, the Au film break-up into nanoclusters whose mean size and surface density are tunable by the laser fluence. A second methodology exploits, instead, the patterning effects of standard furnace thermal processes on the Au film deposited on the ITO. We observe, in this case, a peculiar shape evolution from pre-formed nanoclusters during the Au deposition…

NanoclusterLaser annealingMaterials scienceNanostructureFabricationNanoringPatterning effectGold depositAnnealing (metallurgy)NanotechnologyFluenceSettore ING-INF/01 - Elettronicalaw.inventionNanoclusterslawThermalDeposition stageAuGeneral Materials ScienceNanostructuringTransparent conducting filmDepositMechanical EngineeringNanoringsTransparent conductive oxides Conductive filmAnnealing temperatureCondensed Matter PhysicsLaserAu; ITO; NanostructuringFurnace annealingNanostructuresNanostructured materialFabrication proceMechanics of MaterialsOxide films GoldITO
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Sputtered cuprous oxide thin films and nitrogen doping by ion implantation

2016

Abstract The structural, optical and electrical properties of sputtered cuprous oxide thin films have been optimized through post-deposition thermal treatments. Moreover we have studied the effects of nitrogen doping introduced by ion implantation followed by the optimized oxidant thermal annealing. Three concentrations have been used, 0.6 N%, 1.2 N%, and 2.5 N%. Along with the preservation of the Cu 2 O phase, a slight optical band gap narrowing and a significant conductivity enhancement has been observed with respect to the undoped samples. These results can be justified by the absence of further oxygen vacancies promoted by dopant introduction and by the substitution of O atoms by N ones…

OxidantPostimplantation annealingLattice configurationMaterials scienceBand gapAnnealing (metallurgy)NitrogenInorganic chemistryOxidePhotovoltaic application02 engineering and technology01 natural sciencesOxygen vacancieSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiachemistry.chemical_compoundSputtering0103 physical sciencesMaterials ChemistryDopingSemiconductor dopingConductivity enhancementDoping (additives)Thin filmIonDepositionOxide film010302 applied physicsDopantDopingMetals and AlloysSputteringSurfaces and Interfaces021001 nanoscience & nanotechnologyOut of equilibriumSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsEnergy gapOptical and electrical propertieIon implantationchemistryIon implantationThermal-annealing0210 nano-technologyCopperCuprous oxide
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Photoelectrochemical Synthesis of Conducting Polymers on Large Band Gap Nb2O5 and Ta2O5 Anodic Oxide Films

2008

Photoelectrochemical Synthesis Conducting Polymers Nb2O5 Ta2O5 Anodic Oxide Films
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Physico-chemical Properties of Anodic Oxide Films: from Passivity to Electronics

2014

Physico-chemical Properties Anodic Oxide Films Passivity Thin film oxide Electronic Materials Photoelectrochemistry Electrochemical Impedance SpectroscopySettore ING-IND/23 - Chimica Fisica Applicata
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Size dependent light absorption modulation and enhanced carrier transport in germanium quantum dots devices

2015

Quantum confinement in closely packed arrays of Ge quantum dots (QDs) was studied for energy applications. In this work, we report an efficient tuning mechanism of the light harvesting and detection of Ge QDs. Thin films of SiGeO alloys, produced by rf-magnetron sputtering, were annealed at 600 degrees C in N-2 to induce precipitation of small amorphous Ge QDs into the oxide matrix. Varying the Ge content, the QD size was tailored between 2 and 4 nm, as measured by high resolution transmission electron microscopy. X-ray photoelectron spectroscopy (XPS) measurements indicate the formation of pure SiO2, as well as the presence of a sub-stoichiometric Ge oxide shell at the QD interface. Light …

Precipitation (chemical)Materials scienceAmorphous alloyBand gapchemistry.chemical_elementHigh resolution transmission electron microscopyPhotoconductive gainGermaniumNanocrystalMetal-insulator semiconductor deviceSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaAbsorption spectroscopyQuantum confinement effectQuantum confinementElectromagnetic wave absorptionLight absorptionThin filmGermanium oxideOxide filmHigh-resolution transmission electron microscopyGermanium quantum dotPotential wellMIS deviceAmorphous filmGermaniumQuantum dotsRenewable Energy Sustainability and the Environmentbusiness.industryPhotoconductivitySolar cellPreferential trappingMIM deviceSemiconductor deviceSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPhotovoltaicschemistryMetal insulator boundarieQuantum dotrf-Magnetron sputtering Semiconductor quantum dotOptoelectronicsCharge carrierX ray photoelectron spectroscopy Effective mass approximationbusinessQuantum chemistryPhotovoltaicMagnetron sputteringSolar Energy Materials and Solar Cells
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Physico-chemical Characterization of Aluminium Oxide Films Grown on Etched Foils for Electrolytic Capacitors

2012

Settore ING-IND/23 - Chimica Fisica ApplicataPhysico-chemical CharacterizationAluminium Oxide FilmElectrolytic Capacitors
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